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■ Abbreviation / Long Form : PEALD / plasma-enhanced atomic layer deposition

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Total Number of Papers: 77
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Abbreviation:   PEALD  (>> Co-occurring Abbreviation)
Long Form:   plasma-enhanced atomic layer deposition
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No. Year Title Co-occurring Abbreviation
2020 Atomic layer deposition of nitrogen doped Al-phosphate coatings for Li-ion battery applications. NMC, TMA
2020 Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study. ---
2020 Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications. TMDs
2020 MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. C-V, FESEM, GIXRD, MOS, RBS, TMA, TTIP
2020 Plasma enhanced atomic layer deposition of plasmonic TiN ultrathin films using TDMATi and NH3. TiN
2020 Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers. TMDs
2020 Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. GPC, PET
2019 A large-scale, ultrahigh-resolution nanoemitter ordered array with PL brightness enhanced by PEALD-grown AlN coating. MQW, PL
2019 Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition. ALA, AlN, MOCVD
10  2019 Analysis of Optical Plasma Monitoring in Plasma-Enhanced Atomic Layer Deposition Process of Al₂O₃. ---
11  2019 Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition. ---
12  2019 Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution. HER
13  2019 Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition. MS
14  2019 High-kappa Dielectric on ReS₂: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al₂O₃. AFM, ALD, TMD, XPS
15  2019 Interfacial Tailoring for the Suppression of Impurities in GaN by In Situ Plasma Pretreatment via Atomic Layer Deposition. ---
16  2019 Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices. ---
17  2019 On the transformation of "zincone"-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition. EP, SE, XRD
18  2019 PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases. MIS, NAP-XPS
19  2019 Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature. PMe3, SERS
20  2019 Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability. TiN
21  2018 Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films. GRs
22  2018 Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane. ---
23  2018 In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride. DSBAS
24  2018 Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper. WER
25  2018 Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology. ---
26  2018 Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride. CSN-2
27  2018 Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen. SiN
28  2018 TiOxNy Modified TiO2 Powders Prepared by Plasma Enhanced Atomic Layer Deposition for Highly Visible Light Photocatalysis. ---
29  2018 Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. ---
30  2017 Advances in the fabrication of graphene transistors on flexible substrates. FETs, Gr-FETs, PEN
31  2017 AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition. BV, HEMT, XPS
32  2017 Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies. ---
33  2017 Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition. TEM, XPS
34  2017 Hierarchically-Designed 3D Flower-Like Composite Nanostructures as an Ultrastable, Reproducible, and Sensitive SERS Substrate. EGNPs, SERS
35  2017 In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications. VO, XPS
36  2017 Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition. ---
37  2017 Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition. QCM
38  2017 Low-Temperature One-Step Growth of AlON Thin Films with Homogenous Nitrogen-Doping Profile by Plasma-Enhanced Atomic Layer Deposition. ---
39  2017 Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes. OLEDs, QCM, QMS
40  2017 Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications. DCM
41  2017 Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings. ICP-MS, SEM, TNT, XPS
42  2017 PEALD-Grown Crystalline AlN Films on Si (100) with Sharp Interface and Good Uniformity. AlN, GaN, GIXRD, SE, TEM, XRR
43  2017 Performance and Stability Enhancement of In-Sn-Zn-O TFTs Using SiO2 Gate Dielectrics Grown by Low Temperature Atomic Layer Deposition. PBS, TFTs
44  2017 Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition. ---
45  2017 Selective Deposition of Multiple Sensing Materials on Si Nanobelt Devices through Plasma-Enhanced Chemical Vapor Deposition and Device-Localized Joule Heating. JH, Pt, ZnO
46  2017 Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography. FIB
47  2016 Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer. MOSFET
48  2016 Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements. LPGs
49  2016 Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application. RMS, TFTs
50  2016 PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells. OCV, YSZ
51  2016 Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate. ---
52  2016 Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor. ---
53  2016 Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid. ALD, HF, SiN, WERs
54  2016 Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode. AFM, GPC, TTIP, XRD
55  2016 The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering. ---
56  2015 Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. Ru
57  2015 Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition. AR, TDMA-Ti
58  2015 Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide. ---
59  2015 Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS. DC
60  2015 Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks. T-ALD
61  2015 Plasma-enhanced atomic layer deposition of nanoscale yttria-stabilized zirconia electrolyte for solid oxide fuel cells with porous substrate. YSZ
62  2015 Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2. ---
63  2015 Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions. ---
64  2015 Uniformity and passivation research of Al2O3 film on silicon substrate prepared by plasma-enhanced atom layer deposition. D it, TMA
65  2014 Al2O3/TiO2 nanolaminate thin film encapsulation for organic thin film transistors via plasma-enhanced atomic layer deposition. NL
66  2014 Effects of TiO₂ interfacial atomic layers on device performances and exciton dynamics in ZnO nanorod polymer solar cells. EIS, FF, PCE, TA
67  2013 Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films. RT, T-ALD, XPS
68  2013 Real-time identification of the evolution of conducting nano-filaments in TiO2 thin film ReRAM. JMA, RS
69  2012 Effects of NH3 plasma pre-treatment of Ta substrate on atomic layer deposition of Cu thin film. ---
70  2012 Thermal stability of atomic layer deposited Ru layer on Si and TaN/Si for barrier application of Cu interconnection. ---
71  2012 Thermally evaporated SiO thin films as a versatile interlayer for plasma-based OLED passivation. OLED, PECVD, SiO, WVTR
72  2011 Growth behavior of iridium on Si substrates prepared by plasma enhanced atomic layer deposition. Ir
73  2011 Improved oxygen diffusion barrier properties of ruthenium-titanium nitride thin films prepared by plasma-enhanced atomic layer deposition. ---
74  2011 Silicide-induced multi-wall carbon nanotube growth on silicon nanowires. MWNT
75  2009 Preparation of CNT-copper matrix composite films. ---
76  2008 Spontaneous formation of vertical magnetic-metal-nanorod arrays during plasma-enhanced atomic layer deposition. NRs
77  2008 Titanium dioxide thin films deposited by plasma enhanced atomic layer deposition for OLED passivation. OLED, PES, TDMATi, WTVR