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■略語／展開語 : ILT／Inverse lithography technology

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合計出現文献数:

13

略語:

ILT

(

>>共起略語

)

展開形:

Inverse lithography technology

ILT (13)回

Inverse lithography technology (4)回

inverse lithography technology (3)回

Inverse lithography technique (2)回

inverse lithography techniques (1)回

Inverse Lithography Technology (1)回

Inverse lithography techniques (1)回

inverse lithography technique (1)回

ILT / Inverse lithography technology (4)回

ILT / inverse lithography technology (3)回

ILT / Inverse lithography technique (2)回

ILT / Inverse Lithography Technology (1)回

ILT / Inverse lithography techniques (1)回

ILT / inverse lithography technique (1)回

ILT / inverse lithography techniques (1)回

No.
発表年
題目
共起略語

1

2025

Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement.
FD-ILT, HF, LF

2

2023

Effective multi-objective inverse lithography technology at full-field and full-chip levels with a hybrid dynamic priority algorithm.
EUVL, HDP, MOAs, SMO, SO

3

2023

Fast inverse lithography approach based on a model-driven graph convolutional network.
DCCS, MGCN

4

2023

Inverse lithography physics-informed deep neural level set for mask optimization.
DL, ILDLS, OPC, PW

5

2022

Source and mask optimizing with a defocus antagonism for process window enhancement.
CD, DGASMO, DOF, EL, PW, SMO, SMO-Adam

6

2020

Fast inverse lithography based on dual-channel model-driven deep learning.
DMDL

7

2019

Efficient optical proximity correction based on semi-implicit additive operator splitting.
AOS

8

2019

Model-driven convolution neural network for inverse lithography.
MCNN

9

2019

Nonlinear compressive inverse lithography aided by low-rank regularization.
---

10

2015

Sparse nonlinear inverse imaging for shot count reduction in inverse lithography.
MBF, VSB

11

2014

Single spherical mirror optic for extreme ultraviolet lithography enabled by inverse lithography technology.
EUV

12

2011

Robust level-set-based inverse lithography.
---

13

2010

Level-set-based inverse lithography for photomask synthesis.
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