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Abbreviation : ACL
Long Form : amorphous carbon layer
No. Year Title Co-occurring Abbreviation
2021 Surface Analysis of Amorphous Carbon Thin Film for Etch Hard Mask. DRAM, HAR
2021 Surface Analysis of TMCTS-Based SiOC(H) Low-k Dielectrics in Post-Etch Strip of ACL Hardmask. FTIR, XPS
2016 Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas. ---
2016 Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks. CCP, CD, HF, LF, MLHM
2016 Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma. ---